| 单词 | euv lithography |
| 释义 | > as lemmasEUV lithography EUV lithography n. Electronics a (proposed) method of lithography (lithography n. Additions) using radiation of wavelengths falling in the extreme ultraviolet range (esp. 13.5 nanometres). ΚΠ 1994 Microelectronic Engin. 23 279 (header) Silylated positive tone resists for EUV lithography at 14 nm. 2015 P. Di Lazzaro et al. in D. Bleiner et al. Short Wavelength Lab. Sources 277 The most studied gas for debris mitigation has been argon, as it is relatively transparent at 13.5 nm, the wavelength of choice for EUV lithography. < as lemmas |
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