| 释义 |
photoresist|fəʊtəʊrɪˈzɪst|
Also photo-resist.
[f. photo- 1 + resist n.]
A photosensitive resist which when exposed to (usu. ultraviolet) light loses either its resistance or its susceptibility to attack by an etchant or solvent.
1953Printing Mag. Oct. 56/1 The Kodak Photo-Resist, developed by Eastman Kodak Co., has great possibilities. It is the result of an extensive study and seems to possess ideal properties for a photoresist. 1960Times Rev. Industry Aug. 46/1 The copper-clad phenolic panels..are sprayed with a photo-resist. 1965D. I. Gaffee in L. Holland Thin Film Microelectronics vi. 261 Kodak Photo-resist was originally designed for making letter-press printing plates and lithographic plates. 1969R. & E. Coordinator (Res. & Engin. Council Graphic Arts Industry) Apr. 10/1 The new photoresist can be used in chemical milling of copper, copper alloys, and stainless steel, provided only acid solution etchants are used. 1972Daily Tel. 23 Mar. 30 (Advt.), The Applications Laboratory requires a technologist to work on new and improved Kodak lithographic printing plates... The person filling the post will probably have had experience with similar plates.., including some knowledge of photo⁓resists. 1973Sci. Amer. Apr. 70/1 (caption) High-performance MOSFET is made in these steps. Light admitted through a mask sensitizes a ‘photoresist’ protecting a silicon oxide layer grown on a silicon wafer... Unprotected silicon oxide is etched away and phosphorus atoms are diffused into them to produce ‘source’ and ‘drain’ areas. |