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单词 gettering
释义

getteringn.

Brit. /ˈɡɛtərɪŋ/, U.S. /ˈɡɛdərɪŋ/
Origin: Probably formed within English, by derivation. Etymons: getter n., -ing suffix1; getter v., -ing suffix1.
Etymology: Probably originally < getter n. + -ing suffix1. In later use probably partly also < getter v. + -ing suffix1. Compare earlier gettered adj.
A process by which impurities are removed from a vacuum chamber, a semiconductor material, etc. using a getter (getter n. 2c); the process of applying a getter to a vacuum tube or other device or material; (occasionally) the getter itself. Frequently attributive. Compare getter v.
ΚΠ
1921 Gen. Sci. Q. Mar. 178 Gettering. Before the filament is draped or wound on the supports it is run through a chemical solution called getter which forms a coating on its surface.
1931 L. B. Turner Wireless (1936) vii. 210 The gettering process consists in volatilising a fragment of magnesium (or other material) mounted within the tube, which deposits itself on the glass and takes with it, in chemical combination or otherwise, most of the residual molecules of gas left after the pumping.
1943 J. Yarwood High Vacuum Technique v. 51 Gettering is carried out at the lowest possible pressure, and the magnesium or barium pellet reduces the pressure in the valve to less than 10−5 mm. Hg.
1967 L. Ward & J. P. Bunn Introd. High Vacuum Technol. iii. 65 The gettering process..can obviously be used to remove gas from a system and hence produce a pumping action.
1970 D. J. Dumin in C. P. Marsden Silicon Device Processing (Nat. Bureau Stand. Spec. Publ. 337) 82 The density of the donor-acceptor pair is proportional to the defect density, but..an HCl-O2 gettering step can be used to reduce the pair density.
1998 Economist 12 Sept. 113/1 The new gettering material can be made an integral part of the chamber.
2008 Electrochem. Soc. Trans. 16 267 Development of a gettering technology for metal contamination has become increasingly important for achieving a high [semiconductor] device performance.
This entry has been updated (OED Third Edition, March 2016; most recently modified version published online March 2022).
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n.1921
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